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US 2011/0260361 A1Published application
Safe deparation for nano imprinting
AssigneeMolecular Imprints, Inc.
InventorsSe-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
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Abstract
Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
Claims18
In a nanoimprint lithography system, a method comprising:
- providing a template in contact with a formed patterned layer on a substrate, the template and the substrate having lateral strains dt and db associated therewith, respectively, when subjected to a separation force;
- adjusting the lateral strain of the template (dt) or the substrate (db) or both such that the ratio of the lateral strains (dt/db) is approximately 1 when the template and substrate are subjected to a separation force;
- and
- applying a separation force to separate the template from the substrate.
1 more element
A nanolithography imprint system comprising:
- a substrate having a thickness Tb;
- a template in superimposition with the substrate, the template having a thickness Tt selected such that the ratio (dt/db) of the lateral strain of the template (dt) to the lateral strain (db) of the substrate (db) is approximately 1.
Dependencies are inferred from the claim text.