Method for Patterning Nanomaterial Using Solution Evaporation
AssigneeKorea Advanced Institute of Science and Technology
InventorsJeung-Ku Kang, Kyung-Min Choi, Jung-Hoon Choi, Weon-Ho Shin, Jung-Woo Lee, Hyung-Mo Jeong
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Abstract
Disclosed is a method for patterning a nanomaterial using solution evaporation. More particularly, the method for patterning a nanomaterial using solution evaporation includes; coating the nanomaterial with a polymer material and uniformly dispersing the coated nanomaterial in a solvent to prepare a solution containing the nanomaterial, and pouring the nanomaterial-containing solution on a substrate, enabling the nanomaterial to be patterned after evaporation of the solvent.
Claims7
A method for patterning a nanomaterial using solution evaporation, the method comprising:
- coating the nanomaterial with a polymer material and uniformly dispersing the coated nanomaterial in a solvent to prepare a solution containing the nanomaterial;
- and
- pouring the nanomaterial-containing solution on a substrate, enabling the nanomaterial to be patterned after evaporation of the solvent.
Dependencies are inferred from the claim text.