Circuit pattern inspecting apparatus, management system including circuit pattern inspecting apparatus, and method for inspecting circuit pattern

A method for inspecting a circuit pattern by detecting secondary electrons or back scattering electrons generated by irradiating an electron beam on a substrate having a circuit pattern formed thereon and detecting an abnormality of said circuit pattern, comprising:

• a step of generating an image based on a signal intensity of said detected secondary electrons or back scattering electrons;
• a step of displaying said image on a display section of an interface;
• and
• a step of performing a frequency analysis of a noise contained in said image.

A method for inspecting a circuit pattern in a management system including circuit pattern inspecting apparatus having a plurality of circuit pattern inspecting apparatuses connected with a management apparatus via a communication medium, comprising:

• a step of generating an image by said circuit pattern inspecting apparatus detecting secondary electrons or back scattering electrons generated by irradiating an electron beam on a substrate having a circuit pattern formed thereon;
• a step of detecting an abnormality of said circuit pattern by said circuit pattern inspecting apparatus;
• a step of receiving by said management apparatus results of a frequency analysis of a noise contained in said image generated by said circuit pattern inspecting apparatus and a status of operation of said circuit pattern inspecting apparatus;
• and
• a step of displaying by said management apparatus on a display section a change with time of the noise contained in said image generated by said circuit pattern inspecting apparatus.

A circuit pattern inspecting apparatus comprising:

• an electron optic system column for detecting a secondary signal generated by irradiating an electron beam on a sample having a circuit pattern formed thereon;
• an image processing circuit for producing an acquired image from the detected secondary signal and producing a reference image as adapted for removal of a noise component from said acquired image;
• and
• a processor for extracting a noise component contained in said acquired image by comparing said acquired image and said reference image with each other, performing a frequency analysis, and displaying its results in an interface.

A management system including circuit pattern inspecting apparatus comprising:

• a circuit pattern inspecting apparatus for
• producing an acquired image by detecting a secondary signal generated by irradiating an electron beam on a sample having a circuit pattern formed thereon,
• producing a reference image as adapted for removal of a noise component from said acquired image,
• extracting a noise component contained in said acquired image by comparing said acquired image and said reference image with each other,
• performing a frequency analysis, and
• displaying its results in an interface;
• and a management apparatus for
• receiving said frequency analysis results from a plurality of said circuit pattern inspecting apparatuses via a communication network,
• memorizing them in time series, and
• managing them.