Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
AssigneeHitachi Chemical Company, Ltd.
InventorsHiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
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Abstract
The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
Claims28
A positive tone photosensitive composition, comprising:
- an alkali-soluble resin having a phenolic hydroxyl group,
- a compound producing an acid by light,
- a thermal crosslinking agent and
- an acrylic resin.
Dependencies are inferred from the claim text.