Wafer Level Die Integration and Method Therefor
AssigneeSTATS ChipPAC, Ltd.
InventorsYaojian Lin, Haijing Cao
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AssigneeSTATS ChipPAC, Ltd.
InventorsYaojian Lin, Haijing Cao
Estimating the term…
A method of manufacturing a semiconductor device includes providing a wafer for supporting the semiconductor device. An insulation layer is disposed over a top surface of the wafer. The method includes forming a first interconnect structure over the top surface of the wafer with temperatures in excess of 200° C., forming a metal pillar over the wafer in electrical contact with the first interconnect structure, connecting a semiconductor component to the first interconnect structure, and forming encapsulant over the semiconductor component. The encapsulant is etched to expose a portion of the metal pillar. A buffer layer is optionally formed over the encapsulant. The method includes forming a second interconnect structure over the encapsulant in electrical contact with the metal pillar with temperatures below 200° C., and removing a portion of a backside of the wafer opposite the top surface of the wafer.
A method of making a semiconductor device, comprising:
A method of making a semiconductor device, comprising:
A method of manufacturing a semiconductor device, comprising:
A semiconductor device, comprising:
Dependencies are inferred from the claim text.