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US 2011/0254069 A1Published application
Floating gate type nonvolatile memory device and related methods of manufacture and operation
AssigneeSamsung Electronics Co., Ltd.
InventorsJae Ho KIM, Sung-Hwan JANG, Hye-Young KWON, Sunil SHIM, Hyun-Sil OH
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Abstract
A floating gate type nonvolatile memory device comprises a semiconductor layer, wordlines crossing over the semiconductor layer, and a memory element disposed between the wordlines and facing the semiconductor layer.
Claims9
A nonvolatile memory device, comprising:
- a semiconductor pattern comprising a channel region;
- a floating gate formed over the semiconductor pattern and facing the channel region;
- and
- first and second wordlines formed over the semiconductor substrate on opposite sides of the floating gate;
- wherein the floating gate is separated from the semiconductor pattern by a first distance, and the first and second wordlines are separated from the semiconductor pattern by a second distance greater than the first distance.
2 more elements
9-20. (canceled)
Dependencies are inferred from the claim text.