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US 2011/0253983 A1Published application
Sidewall graphene devices for 3-d electronics
AssigneeAdvanced Micro Devices, Inc.
InventorsAn Chen, Zoran Krivokapic
Life of this patent
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Abstract
A device is provided that includes a structure having a sidewall surface, a layer of material provided on the sidewall surface, and a device structure provided in contact with the layer of material. Fabrication techniques includes a process that includes forming a structure having a sidewall surface, forming a layer of material on the sidewall surface, and forming a device structure in contact with the layer of material, where the device structure and the layer of material are components of a device.
Claims20
A device comprising:
- a structure having a sidewall surface, said structure being formed as a first mesa structure provided on a substrate and having a first length and a second mesa structure provided on said first mesa structure and having a second length that differs from the first length, said second mesa structure adjoining said first mesa structure to form said sidewall surface, said sidewall surface being continuous and planar, and having a varying height dimension and a varying length dimension;
- a layer of material provided on said sidewall surface, said layer of material having a varying width dimension and a varying length dimension corresponding to the varying height dimension and the varying length dimension of said sidewall surface, respectively;
- and
- a device structure provided in contact with said layer of material.
1 more element
A device comprising:
- a structure having a sidewall surface, said structure being formed as a first recessed structure extending within a substrate and having a first length and a second recessed structure extending within said substrate and having a second length that differs from the first length, said second recessed structure adjoining said first recessed structure to form said sidewall surface, said sidewall surface being continuous and planar, and having a varying height dimension and a varying length dimension;
- a layer of material provided on said sidewall surface, said layer of material having a varying width dimension and a varying length dimension corresponding to the varying height dimension and the varying length dimension of said sidewall surface, respectively;
- and
- a device structure provided in contact with said layer of material.
1 more element
A device comprising:
- a structure having a sidewall surface, said sidewall surface being continuous and planar, and said sidewall surface having a varying height dimension and a varying length dimension;
- a layer of material provided on said sidewall surface, said layer of material having a varying width dimension and a varying length dimension corresponding to the varying height dimension and the varying length dimension of said sidewall surface, respectively;
- and
- a device structure provided in contact with said layer of material,
- wherein said structure is a first mesa structure provided on a substrate, and a second mesa structure provided on said first mesa structure, or
- wherein said structure is a first recessed structure extending within said substrate, and a second recessed structure extending within said substrate.
3 more elements
Dependencies are inferred from the claim text.