Semiconductor processing apparatus

A semiconductor processing apparatus, comprising:

• a processing tube that houses a substrate support member that supports a plurality of substrates stacked at a prescribed pitch in a vertical direction, said substrate support member having a lid plate provided above a region in which the plurality of substrates are stacked;
• a processing chamber that is formed in the processing tube and that processes the plurality of substrates;
• a gas supply part that extends in a direction in which said substrates are stacked in said substrates are stacked in said processing tube and that has a plurality of gas supply openings;
• an exhaust part that is opened onto said processing tube;
• a gas rectifying plate that is disposed in a space between a penumbra of the substrates supported on said substrate support member and an inner wall of said processing tube, and that extends from said gas supply part in a circumferential direction of said processing tube and in the direction in which said substrates are stacked;
• a first gas flow regulating part that is in a space in said processing chamber that is above a top-most gas supply opening and said lid plate of the substrate support member;
• and
• wherein the first gas flow regulating part is fixed in the processing chamber and remains in the processing chamber when the substrate support member is unloaded to an outside of the processing chamber.