Showerhead assembly with metrology port purge
AssigneeApplied Materials, Inc.
InventorsAlexander Tam, Anzhong Chang, Sumedh Acharya
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AssigneeApplied Materials, Inc.
InventorsAlexander Tam, Anzhong Chang, Sumedh Acharya
Estimating the term…
A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. In one embodiment, the apparatus is a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume. In one embodiment, the showerhead includes metrology ports with purge gas assemblies configured and positioned to deliver a purge gas to prevent deposition thereon. In one embodiment, the metrology port is configured to receive a temperature measurement device, and the purge gas assembly is a concentric tube configuration configured to prevent deposition on components of the temperature measurement device. In one embodiment, the metrology port has a sensor window and is configured to receive an optical measurement device, and the purge gas assembly and sensor window are configured to prevent deposition on the sensor window.
A showerhead assembly, comprising:
A showerhead assembly, comprising:
A showerhead assembly, comprising:
Dependencies are inferred from the claim text.