Method for simulating electromagnetic field, electromagnetic field simulation apparatus and method for manufacturing semiconductor device

A method for manufacturing a semiconductor device comprising:

• setting a first mesh on a calculation region provided based on a medium through which an electromagnetic wave propagates;
• calculating an electromagnetic field distribution on the first mesh using a frequency region solution based on characteristic values of the medium allocated on the first mesh;
• setting a second mesh on the calculation region;
• allocating the electromagnetic field distribution obtained by the frequency region solution to the second mesh;
• updating the electromagnetic field distribution allocated to the second mesh in a predetermined time unit by a time region solution;
• setting lithography conditions based on the electromagnetic field distribution obtained by the time region solution;
• transferring a pattern latent image to a resist formed on a semiconductor wafer based on the lithography conditions;
• patterning the resist by developing the resist having the pattern latent image transferred;
• and
• processing the semiconductor wafer using the patterned resist as a mask.