Semiconductor device and method for manufacturing the same

A method for manufacturing a semiconductor device comprising the steps of:

• forming a semiconductor layer over a substrate having an insulating surface;
• forming an insulating film which covers the semiconductor layer;
• forming a pair of electrodes one of which is electrically connected to the semiconductor layer, on the same plane over the insulating film;
• forming a pair of insulating layers over the insulating film;
• and
• forming a layer containing an organic compound so as to overlap a region which is surrounded by the pair of electrodes and the pair of insulating layers.

A method for manufacturing a semiconductor device comprising the steps of:

• forming a switching element comprising a semiconductor layer over a substrate;
• forming an insulating film over the switching element;
• forming a first electrode electrically connected to the switching element, on an upper surface of the insulating film;
• forming a second electrode on the upper surface of the insulating film;
• and
• forming a layer containing an organic compound covering a gap between the first and second electrodes, selectively.