Method for manufacturing solar battery cell
AssigneeMitsubishi Electric Corporation
InventorYoichiro Nishimoto
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Abstract
A method includes: a first step of forming a passivation film on a first surface of a crystalline silicon substrate of a first conductive type; a second step of diffusing an element of a second conductive type into a second surface of the crystalline silicon substrate by thermal diffusion to form a diffusion layer, whereby a pn junction is formed; a third step of forming an antireflection film on the diffusion layer; a fourth step of disposing a first electrode paste on the second surface of the crystalline silicon substrate; a fifth step of disposing a second electrode paste on the passivation film; and a sixth step of firing the first electrode paste and the second electrode paste to form electrodes.
Claims7
A method for manufacturing a solar battery cell, the method comprising:
- a first step of forming a passivation film on a first surface of a silicon substrate of a first conductive type;
- a second step of diffusing an element of a second conductive type into a second surface of the crystalline silicon substrate by thermal diffusion to form a diffusion layer, whereby a pn junction is formed;
- a third step of forming an antireflection film on the diffusion layer;
- a fourth step of disposing a first electrode paste on the second surface of the crystalline silicon substrate;
- a fifth step of disposing a second electrode paste on the passivation film;
- and
- a sixth step of firing the first electrode paste and the second electrode paste to form electrodes.
(canceled)
Dependencies are inferred from the claim text.