Heat processing apparatus and heat processing method

A computer readable non-transitory storage medium that stores a control program for a heat processing apparatus, which includes

• a heating plate configured to support and heat a substrate,
• a cover configured to surround a space above the heating plate,
• a first gas flow forming mechanism configured to form first gas flows within the space above the heating plate, the first gas flows being downward flows of gas uniformly supplied onto an upper surface of the substrate supported by the heating plate,
• a second gas flow forming mechanism configured to form second gas flows within the space above the heating plate, the second gas flows being sideward flows of gas along the upper surface of the substrate supported by the heating plate, and
• a control mechanism configured to control an operation of the apparatus and including a computer,
• wherein the control program, when executed, causes the computer to control the apparatus to conduct a heat processing sequence, which comprises:
• supporting a target substrate by the heating plate to heat the target substrate and surrounding the space above the heating plate by the cover;
• and
• then performing a heat process on the target substrate by heating the target substrate by the heating plate,
• wherein the heat process is performed along with first and second modes of gas flows sequentially set in this order while heating the target substrate by the heating plate,
• the first mode uses the downward flows formed by the first gas flow forming mechanism to uniformize the heat process over the target substrate, and
• the second mode uses the sideward flows formed by the second gas flow forming mechanism while exhausting gas from the space above the heating plate to exhaust and remove at least one of gas and sublimed substances generated from the target substrate.