Acetal compound, polymer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji HASEGAWA, Jun HATAKEYAMA, Takeshi NAGATA, Seiichiro TACHIBANA, Takeshi KINSHO
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Abstract
The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.
Claims15
An acetal compound having the general formula (1):
- wherein R1 is hydrogen, methyl or trifluoromethyl, R2 is a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R3 and R4 are each independently hydrogen or a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R2 and R3 may bond together to form an aliphatic hydrocarbon ring with the carbon atoms to which they are attached, X1 and X2 are each independently a single bond or a straight or branched divalent C1-C4 hydrocarbon group, R5 is a straight, branched or cyclic monovalent C1-C15 hydrocarbon group, and k1 is an integer of 1 to 3.
A polymer comprising recurring units having the general formula (2):
- wherein R1 is hydrogen, methyl or trifluoromethyl, R2 is a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R3 and R4 are each independently hydrogen or a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R2 and R3 may bond together to form an aliphatic hydrocarbon ring with the carbon atoms to which they are attached, X1 and X2 are each independently a single bond or a straight or branched divalent C1-C4 hydrocarbon group, R5 is a straight, branched or cyclic monovalent C1-C15 hydrocarbon group, and k1 is an integer of 1 to 3.
Dependencies are inferred from the claim text.