Back to results
US 2011/0236595 A1Published application
Curable composition for imprints, patterning method and pattern
AssigneeFUJIFILM Corporation
InventorsKunihiko Kodama, Kyouhei Sakita, Hiroyuki Yonezawa
Life of this patent
Estimating the term…
Abstract
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
Claims20
A curable composition for imprints comprising a polymerizable monomer (Ax) and a photopolymerization initiator, wherein the polymerizable monomer (Ax) is represented by the following formula (I);
- wherein R1 represents a hydrogen atom, an alkyl group, or a halogen atom;
- Z is a group having an aromatic group and having a molecular weight of 100 or more;
- and, when the polymerizable monomer (Ax) is liquid at 25° C., the polymerizable monomer (Ax) has a viscosity of 500 mPa·s or less.
A reaction diluent comprising a compound represented by the following formula (IV);
- wherein R1 represents a hydrogen atom, an alkyl group, or a halogen atom;
- X2 is a single bond, or a hydrocarbon group which may have a linking group containing a hetero atom in the chain of the linking group;
- Y2 represents a substituent having a molecular weight of 15 or more, the substituent being other than an aromatic group-containing group;
- n2 represents an integer of 0 to 3;
- and, when n2 is 0, X2 is a hydrocarbon group having two or three carbon atoms.
2 more elements
Dependencies are inferred from the claim text.