Back to results
US 2011/0236288 A1Published application
Method for producing high-purity sio2 from silicate solutions
OwnerChristian Panz, Markus Ruf +6inventors
InventorsChristian Panz, Markus Ruf, Guido Titz, Florian Paulat, Hartwig Rauleder, Sven Müller, Jürgen Behnish, Jens Peltzer
Life of this patent
Estimating the term…
Abstract
The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 having a specific impurity spectrum and use thereof.
Claims16
Method for the production of high purity silicon dioxide comprising the following steps:
- a. producing an initial charge of an acidulant, or an acidulant with water, with a pH value of less than 2
- b. providing a silicate solution with a viscosity of 2 to 10,000 poise
- c. adding the silicate solution from step b) to the initial charge from step a) to provide a precipitation suspension, such that the pH value of the precipitation suspension remains at all times at a value of less than 2
- d. separating and washing the resultant silicon dioxide, with a washing medium having a pH value of less than 2
- e. drying the resultant silicon dioxide.
2 more elements
Silicon dioxide, wherein the content of
- a. aluminum is less than 1 ppm
- b. boron is less than 0.1 ppm
- c. calcium is less than or equal to 0.3 ppm
- d. iron is less than or equal to 0.6 ppm
- e. nickel is less than or equal to 0.5 ppm
- f. phosphorus is less than 0.1 ppm
- g. titanium is less than or equal to 1 ppm
- h. zinc is less than or equal to 0.3 ppm,
- the total of the abovementioned impurities and sodium and potassium amounting to less than 5 ppm.
6 more elements
Dependencies are inferred from the claim text.