Substrate processing apparatus and substrate processing method
AssigneeSokudo Co., Ltd.
InventorKoji KANEYAMA
Life of this patent
Estimating the term…
Abstract
A substrate subjected to back surface cleaning by a back surface cleaning processing unit is held by a hand of an interface transport mechanism and transported to a cooling unit. The substrate whose temperature has been adjusted by the cooling unit is held by a hand of the interface transport mechanism and transported to an exposure device. The substrate subjected to exposure processing by the exposure device is held by a hand of the interface transport mechanism and transported from the exposure device to a substrate platform.
Claims11
A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:
- a processing section for subjecting a top surface of a substrate to processing;
- and
- an interface for receiving and transferring the substrate between said processing section and said exposure device, wherein
- said processing section includes a photosensitive film forming unit arranged to form a photosensitive film made of a photosensitive material on the top surface of the substrate,
- said interface includes
- a back surface cleaning unit arranged to clean a back surface of the substrate after formation of the photosensitive film by said photosensitive film forming unit and before exposure processing by said exposure device, and
- a transport device that includes a plurality of holders, each of which transports the substrate while holding the substrate, and
- said transport device is configured to transport the substrate after back surface cleaning by said back surface cleaning unit to said exposure device while holding the substrate after the back surface cleaning using one or a plurality of holders of said plurality of holders, and transport the substrate after the exposure processing from said exposure device while holding the substrate after the exposure processing using another holder of said plurality of holders.
A substrate processing method for subjecting a substrate to processing using a substrate processing apparatus arranged adjacent to an exposure device, wherein said substrate processing apparatus includes a photosensitive film forming unit, a back surface cleaning unit and a transport device including a plurality of holders, and
- said substrate processing method comprising the steps of:
- forming a photosensitive film made of a photosensitive material on a top surface of the substrate by said photosensitive film forming unit;
- cleaning a back surface of the substrate by said back surface cleaning unit after said formation of the photosensitive film and before exposure processing by said exposure device;
- transporting the substrate after said cleaning to said exposure device while holding the substrate after said cleaning using one or a plurality of holders of said plurality of holders of said transport device;
- and
- transporting the substrate after the exposure processing from said exposure device while holding the substrate after the exposure processing using another holder of said plurality of holders of said transport device.
Dependencies are inferred from the claim text.