Semiconductor memory device
AssigneeKabushiki Kaisha Toshiba
InventorsYoshiaki FUKUZUMI, Hideaki Aochi
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Abstract
A semiconductor memory device according to one embodiment of the present invention includes a dielectric film configured to store information depending on presence or absence of a conductive path therein, and a plurality of electrodes provided to contact a first surface of the dielectric film. The conductive path can be formed between two electrodes arbitrarily selected form the plurality of electrodes. The conductive path has a rectifying property of allowing a current to flow more easily in a first direction connecting arbitrary two electrodes than in a second direction opposite to the first direction. The largest possible number of the conductive paths that may be formed is larger than the number of the plurality of electrodes.
Claims20
A semiconductor memory device, comprising:
- a dielectric film configured to store information depending on presence or absence of a conductive path therein;
- and
- a plurality of electrodes provided to contact a first surface of the dielectric film,
- the conductive path being able to be formed between two electrodes arbitrarily selected from the plurality of electrodes,
- the conductive path having a rectifying property of allowing a current to flow more easily in a first direction connecting arbitrary two electrodes than in a second direction opposite to the first direction, and
- the largest possible number of the conductive paths that may be formed being larger than the number of the plurality of electrodes.
A semiconductor memory device, comprising:
- a dielectric film configured to store information depending on presence or absence of a conductive path therein;
- a first number of first electrodes provided to contact a first surface of the dielectric film;
- and
- a second number of second electrodes provided to contact a second surface of the dielectric film,
- the conductive path being able to be formed between one electrode arbitrarily selected from the first electrodes and one electrode arbitrarily selected from the second electrodes,
- the conductive path having a rectifying property of allowing a current to flow more easily in a first direction connecting arbitrary two electrodes than in a second direction opposite to the first direction, and
- the largest possible number of the conductive paths that may be formed being N×M, when the first number is N and the second number is M.
A semiconductor memory device, comprising:
- a plurality of first lines provided parallel with one another;
- a plurality of second lines formed to intersect the plurality of first lines;
- a plurality of memory cells, each of the memory cells including a dielectric film configured to store information depending on presence or absence of a conductive path therein and a plurality of electrodes provided to contact a first surface of the dielectric film;
- and
- a plurality of transistors provided between one of the electrodes of the memory cells and one of the plurality of the first line respectively,
- the conductive path being able to be formed between two electrodes arbitrarily selected from the plurality of electrodes,
- the conductive path having a rectifying property of allowing a current to flow more easily in a first direction connecting arbitrary two electrodes than in a second direction opposite to the first direction, and
- gate electrodes of the plurality of transistors each connected to the electrodes of one of the memory cells are connected to one of the second lines.
Dependencies are inferred from the claim text.