Pattern measuring method and pattern measuring apparatus
OwnerMakoto Kaneko, Yasuhiko Ishibashiinventors
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Abstract
According to one embodiment, a pattern measuring method includes: irradiating, from a plurality of different incident directions, electromagnetic waves on a periodical structure pattern in which a plurality of patterns are periodically arrayed and partially overlap one another; detecting the electromagnetic waves scattered by the periodical structure pattern and detecting scattering profiles of the electromagnetic waves; and measuring, based on the detected scattering profiles, a pattern shape of the periodical structure pattern. Each of the different incident directions is an incident direction in which the patterns included in the periodical structure pattern do not partially overlap each other.
Claims8
A pattern measuring method comprising:
- irradiating, from a plurality of different incident directions, electromagnetic waves on a periodical structure pattern in which a plurality of patterns are periodically arrayed and partially overlap one another;
- detecting the electromagnetic waves scattered by the periodical structure pattern and detecting scattering profiles of the electromagnetic waves;
- and
- measuring, based on the detected scattering profiles, a pattern shape of the periodical structure pattern, wherein
- in the irradiating the electromagnetic waves, each of the different incident directions is an incident direction in which the patterns included in the periodical structure pattern do not partially overlap each other.
A pattern measuring apparatus comprising:
- an irradiating unit that irradiates, from a plurality of different incident directions, electromagnetic waves on a periodical structure pattern in which a plurality of patterns are periodically arrayed and partially overlap one another;
- a detecting unit that detects the electromagnetic waves scattered by the periodical structure pattern and detects scattering profiles of the electromagnetic waves;
- and
- a measuring unit that measures, from on the detected scattering profiles, a pattern shape of the periodical structure pattern, wherein
- in the irradiating unit, each of the different incident directions is an incident direction in which the patterns included in the periodical structure pattern do not partially overlap each other.
Dependencies are inferred from the claim text.