Projection exposure apparatus for microlithography for the production of semiconductor components

An apparatus, comprising:

• an optical assembly comprising:
• an optical element;
• and
• an actuator configured to mechanically actuate the optical element;
• and
• a member configured to carry out deformation of the optical element,
• wherein:
• the member is selected from the group consisting of a control signal transmission device, an energy transmission device and combinations thereof;
• if the member comprises an energy transmission device, the energy transmission device is configured to provide contactless transmission of energy;
• the member is configured to introduce no parasitic mechanical effects into the optical assembly at least during specific operating states of the apparatus;
• and
• the apparatus is a microlithography projection objective.