US 2011/0226739 A1 · PROCESS CHAMBER LINER WITH APERTURES FOR PARTICLE CONTAINMENT

Abstract

An apparatus for use within a process chamber is provided. The apparatus includes a liner adapted to cover the sidewalls of the process chamber, with apertures corresponding to various inlets and outlets in the process chamber. In addition, the liner has one or more apertures on its bottom surface, which allow particles to pass through the liner. The liner is designed to be shorter in height than the sidewalls of the process chamber. This allows the liner to be placed within the chamber such that its bottom surface is above the floor of the process chamber. This minimizes the possibility of particles that have fallen onto the process chamber floor becoming re-suspended at a later time. According to a second aspect of the disclosure, a bottom liner is provided. This liner can be used in conjunction with a conventional liner or in a process chamber without a liner.

Claims20

Dependent claims

A device for reducing particles within a plasma processing apparatus, said apparatus having sidewalls and a floor, and wherein a platen is positioned on said floor comprising:

a liner comprising:
a side surface, wherein the height of said side surface is less than the height of said sidewall and is configured to contact said sidewall;
and
a bottom surface, spaced above said floor, and defining one or more apertures through which particles may pass such that said particles fall into a volume defined between said floor and said bottom surface;
and
one or more spacers affixed to said bottom surface and configured to space said bottom surface above said floor.

3 more elements

Dependencies are inferred from the claim text.

Process chamber liner with apertures for particle containment

Life of this patent

Process chamber liner with apertures for particle containment

Life of this patent

Abstract

Claims20