Apparatus for wet processing substrate
AssigneesHong Heng Sheng Electronical Technology (HuaiAn) Co., Ltd, Foxconn Advanced Technology Inc.
InventorsYONG-JIAN XUE, JUN CHEN
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AssigneesHong Heng Sheng Electronical Technology (HuaiAn) Co., Ltd, Foxconn Advanced Technology Inc.
InventorsYONG-JIAN XUE, JUN CHEN
Estimating the term…
An exemplary apparatus for wet processing a substrate includes a wet processing system and a water supplying system. The wet processing system includes a preliminary rinsing device, a final rinsing device, and a conveyor. The preliminary rinsing device includes a first tank and a first spraying system above the first tank. The final rinsing device includes a second tank and a second spraying system above the second tank. The conveyor is configured for conveying a substrate from the preliminary rinsing device to the final rinsing device. The water supplying system includes a supply pipe configured for supplying water to the second spraying system, a connecting system communicating the second tank and the first spraying system, and a drain pipe communicating with the first tank.
An apparatus for wet processing a substrate, the apparatus comprising:
An apparatus for wet processing a substrate, the apparatus comprising:
An apparatus for wet processing a substrate, the apparatus comprising:
Dependencies are inferred from the claim text.