Film forming apparatus

A film forming apparatus to form a thin film on a surface of an object to be processed by using a raw material gas comprising a raw material of an organometallic compound, the film forming apparatus comprising:

• a processing container configured to carry out vacuum exhaustion;
• a placing table having a heater configured to dispose the object to be processed thereon;
• and
• a gas introduction mechanism having a plurality of decomposition promoting gas introduction holes facing the placing table, and raw material gas introduction holes, wherein the decomposition promoting gas introduction holes being disposed while facing the object to be processed on the placing table in order to introduce a decomposition promoting gas to promote decomposition of the raw material gas, and the raw material gas introduction holes being disposed while surrounding a formation area of the plurality of decomposition promoting gas introduction holes in order to introduce the raw material gas.