Systems and methods for gas supply and usage

Abstract

This invention relates to gas vaporization and supply system that includes (a) a vessel suitable for holding a bulk quantity of a liquefied gas; (b) at least one heating source positioned on or near the vessel to supply energy to, or remove energy from, the liquefied gas; and (c) a heating source controller adapted to use process variables feedback for dynamically regulating the heating source and maintaining and regulating gas output. The process variables feedback results from cascading sequence control of at least two process variables. The process variables include pressure, temperature, and/or gas output flow rate. This invention also relates to a method for delivery of a gas, e.g., ultra high purity gases, from a liquefied state in a controlled manner to a usage site, e.g., a semiconductor manufacturing facility. This invention provides faster heating system response to fluctuations in customer demand, a longer heater life, and improved reliability.

Dependencies are inferred from the claim text.