Enhanced magnetic plating method
AssigneeInternational Business Machines Corporation
InventorsMATTEO FLOTA, Lubomyr Taras Romankiw, Xiaoyan Shao, Steven Erik Steen, Bucknell Chapman Webb
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Abstract
An apparatus for plating a magnetic film on a substrate includes: a track including a plurality of stopping points along the track; a permanent magnet placed on the track such that the permanent magnet can be moved along the track towards and away from the stopping points; at least one plating tank positioned on the stopping point; and a removable high permeability iron flux concentrator inserted into gaps between the substrate and inside walls of the plating tank, substantially surrounding the substrate and extending around and under the substrate.
Claims9
An apparatus for plating magnetic film on a substrate, the apparatus comprising:
- a track comprising a plurality of stopping points along said track;
- a permanent magnet mounted on the track such that said permanent magnet can be moved along the track towards and away from the plurality of the stopping points along the track;
- a first cell positioned on a first stopping point, wherein said first cell comprises an aqueous solution and the substrate is disposed within said aqueous solution;
- a conformable flux concentrator inserted into the first cell, such that said conformable flux concentrator is inserted into gaps between the substrate and inside walls of the first cell, substantially surrounding the substrate and extending around and under the substrate;
- wherein the permanent magnet surrounds the first cell when positioned at the first stopping point;
- wherein the permanent magnet magnetizes the substrate disposed within the first cell;
- wherein the magnetization is facilitated by the conformable flux concentrator;
- and
- at least one plating tank positioned on the stopping point along the track.
Dependencies are inferred from the claim text.