Method, system, and program product for interactive checking for double pattern lithography violations
AssigneeCadence Design Systems, Inc.
InventorsMin CAO, Roland RUEHL
Life of this patent
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Abstract
Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively.
Claims27
A method for performing interactive editing of an electronic circuit design, the method implemented with a processor, the method comprising:
- identifying an object in a layout of the electronic circuit design, wherein the object is to be manufactured with double patterning technology;
- checking whether the object corresponds to a double pattern violation;
- determining whether a corrective solution can be implemented to resolve the double pattern violation;
- and
- determining whether the corrective solution can be implemented interactively.
A computer program product embodied on a computer usable medium, the computer readable medium having stored thereon a sequence of instructions which, when executed by a processor causes the processor to execute a method for performing interactive editing of an electronic circuit design, the method comprising:
- identifying an object in a layout of the electronic circuit design, wherein the object is to be manufactured with double patterning technology;
- checking whether the object corresponds to a double pattern violation;
- determining whether a corrective solution can be implemented to resolve the double pattern violation;
- and
- determining whether the corrective solution can be implemented interactively.
A system for interactive editing of an electronic circuit design, comprising:
- a processor;
- a memory for holding programmable code;
- and
- wherein the programmable code includes instructions for identifying an object in a layout of the electronic circuit design, wherein the object is to be manufactured with double patterning technology, checking whether the object corresponds to a double pattern violation, determining whether a corrective solution can be implemented to resolve the double pattern violation, and determining whether the corrective solution can be implemented interactively.
Dependencies are inferred from the claim text.