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AssigneesInternational Superconductivity Technology Center, Furukawa Electric Co., Ltd., Japan Fine Ceramics Center
InventorsSeiki Miyata, Hiroyuki Fukushima, Reiji Kuriki, Akira Ibi, Masateru Yoshizumi, Akio Kinoshita, Yutaka Yamada, Yuh Shiohara, Ryuji Yoshida, Takeharu Kato, Tsukasa Hirayama
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Provided is a substrate for superconductive film formation, which includes a metal substrate, and an oxide layer formed directly on the metal substrate, containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm. A method of manufacturing a substrate for superconductive film formation, which includes forming an oxide layer directly on a metal substrate, the oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.
A substrate for superconductive film formation, which comprises:
A method of manufacturing a substrate for superconductive film formation, which comprises forming an oxide layer directly on a metal substrate, the oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.
A method of manufacturing a substrate for superconductive film formation, which comprises forming a chromium layer directly on a metal substrate, and oxidizing the chromium layer to thereby form an oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.
A method of manufacturing a substrate for superconductive film formation, which comprises coating an aqueous solution containing chromium on an upper surface of a metal substrate, and heating the coated layer to form an oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.
A method of manufacturing a substrate for superconductive film formation, which comprises forming an intermediate layer on a metal substrate containing chromium, and heating the metal substrate to a temperature of not higher than 700° C. in an atmosphere containing oxygen to thereby form, between the metal substrate and the intermediate layer, an oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.
A method of manufacturing a superconductive wire, which comprises forming, as an underlying layer, an intermediate layer containing Al2O3 on a metal substrate formed of an alloy containing chromium, and heating the metal substrate to a temperature of not lower than 750° C., thereby not only forming a superconductive film on a surface of the intermediate layer but also forming, between the metal substrate and the intermediate layer, an oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.
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