Aligning successive implants with a soft mask
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsNicholas P.T. BATEMAN, William T. WEAVER
Life of this patent
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Abstract
A first species selectively dopes a workpiece to form a first doped region. In one embodiment, a selective implant is performed using a mask with apertures. A soft mask is applied to the first doped region. A second species is implanted into the workpiece to form a second implanted region. The soft mask blocks a portion of the second species. Then the soft mask is removed. The first species and second species may be opposite conductivities such that one is p-type and the other is n-type.
Claims25
A method of manufacturing a workpiece comprising:
- selectively doping a first species into a workpiece to form at least one first doped region;
- applying a soft mask to said first doped region;
- implanting a second species into said workpiece, wherein said second species forms at least one second doped region and wherein said soft mask blocks a portion of said second species;
- and
- removing said soft mask.
A method of manufacturing a workpiece comprising:
- selectively implanting an n-type species into a workpiece through a mask defining at least one aperture, said mask disposed a distance from said workpiece, wherein said n-type species forms at least one first implanted region;
- applying a soft mask to said first implanted region;
- implanting a p-type species into said workpiece, wherein said p-type species forms at least one second implanted region and wherein said soft mask blocks a portion of said p-type species;
- and
- removing said soft mask.
A method of manufacturing a workpiece comprising:
- selectively implanting a p-type species into a workpiece through a mask defining at least one aperture, said mask disposed a distance from said workpiece, wherein said p-type species forms at least one first implanted region;
- applying a soft mask to said first implanted region;
- implanting an n-type species into said workpiece, wherein said n-type species forms at least one second implanted region and wherein said soft mask blocks a portion of said n-type species;
- and
- removing said soft mask.
Dependencies are inferred from the claim text.