Solid-state imaging device having improved sensitivity and reduced flare
AssigneePanasonic Corporation
InventorsHiroshi SAKOH, Yoshiaki NISHI, Yasuo TAKEUCHI
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Abstract
Provided is a solid-state imaging device that realizes sensitivity improvement while maintaining flare prevention effect even when miniaturization of cell is advanced. The solid-state imaging device according to the present invention includes: light receiving units formed on a semiconductor substrate; an antireflection film arranged above the semiconductor substrate, except above the light receiving units; and microlenses arranged above the light receiving units, in which the antireflection film is formed at a position equal to or higher than a position of the microlenses.
Claims7
A method for manufacturing a solid-state imaging device, said method comprising:
- forming light receiving units on a semiconductor substrate;
- forming microlenses above the light receiving units;
- and
- forming an antireflection film above the semiconductor substrate, except above the light receiving units, so as to reduce light reflection,
- wherein, in said forming of the antireflection film, the antireflection film is formed at a position equal to or higher than a position of the microlenses.
Dependencies are inferred from the claim text.