Fabrication System and Manufacturing Method of Light Emitting Device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Hideaki Kuwabara, Masakazu Murakami
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AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Hideaki Kuwabara, Masakazu Murakami
Estimating the term…
The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
1-28. (canceled)
A manufacturing method for a light emitting device comprising the steps of:
A manufacturing method for a light emitting device comprising the steps of:
A manufacturing method for a light emitting device comprising the steps of:
A system for manufacturing a light emitting device including a film formation chamber, the film formation chamber comprising:
Dependencies are inferred from the claim text.