Intensity selective exposure photomask

A photomask, comprising:

• a plurality of sub-resolution features each having a window formed in a region of attenuating material, the plurality of sub-resolution features including:
• a first array of features each feature including a window having a first width formed in a first region of attenuating material;
• and
• a second array of features each feature including a window having a second width formed in a second region of attenuating material, wherein the first width and the second width are different.

A method, comprising:

• providing design data associated with an integrated circuit device;
• predicting a thickness of a coating layer based on the design data;
• generating a gradating pattern based on the predicted thickness;
• and
• forming a photomask having the gradating pattern.