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US 2011/0217532 A1Published application
Optical component and manufacturing method thereof
AssigneeOlympus Corporation
InventorsTakeshi Deguchi, Yoshito Ito, Kei Kikuchi, Nobuyoshi Toyohara
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Abstract
An optical component includes a multilayered optical thin film formed on a substrate. A critical load value of the optical thin film that includes at least one layer that is formed by a vacuum deposition method is greater than or equal to 30 mN. The critical load value is a value evaluated by a measurement method complying with JIS R3255 “Testing methods for adhesion of thin films on a glass substrate”.
Claims14
An optical component including a multilayered optical thin film formed on a substrate,
- wherein a critical load value of the optical thin film that includes at least one layer that is formed by a vacuum deposition method is greater than or equal to 30 mN, and
- the critical load value being a value evaluated by a measurement method complying with JIS R3255 “Test methods for adhesion of thin films on a glass substrate”.
A method of manufacturing an optical component comprising:
- forming an optical thin film on a substrate,
- wherein a critical load value of the optical thin film that includes at least one layer that is formed by a vacuum deposition method is greater than or equal to 30 mN, and
- the critical load value being a value evaluated by a measurement method complying with JIS R3255 “Testing methods for adhesion of thin films on a glass substrate”.
Dependencies are inferred from the claim text.