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US 2011/0217467 A1Published application
Vacuum processing apparatus and vacuum processing method
AssigneeCanon Anelva Corporation
InventorsHajime SAHASE, Naoki Watanabe, Ge Xu
Life of this patent
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Abstract
A vacuum processing apparatus includes two process chambers and three load-lock chambers which are alternately connected in series, and a transferring device which transfers a plurality of carriers only between the process chamber and the load-lock chambers that are adjacent to each other. A substrate undergoes deposition processing when the carrier is positioned in the process chamber by the transferring device, and the substrate is replaced when the carrier is positioned in the load-lock chamber by the transferring device.
Claims6
A vacuum processing apparatus comprising:
- not less than one process unit;
- load-lock chambers which are more than the process unit by one;
- carriers which are more than the process unit by not less than one;
- and
- a transferring device which transfers the carriers between the process unit and the load-lock chambers that are adjacent to each other,
- wherein
- the process unit and the load-lock chambers are alternately connected in series,
- the load-lock chambers include at least a first load-lock chamber which is adjacent to the process unit on one side, and a second load-lock chamber which is adjacent to the process unit on the other side,
- the carriers include at least a first carrier which reciprocates between the first load-lock chamber and the process unit, and a second carrier which reciprocates between the second load-lock chamber and the process unit, and
- the transferring device synchronously transfers the first carrier and the second carrier in an identical direction.
7 more elements
Dependencies are inferred from the claim text.