Shields for substrate processing systems
AssigneeNovellus Systems, Inc.
InventorsKarl Leeser, Yajie Liu
Life of this patent
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Abstract
A shielding system for a physical vapor deposition (PVD) chamber is disclosed. The PVD chamber includes a pedestal supporting a substrate. The shielding system includes a first annular portion and a second annular portion of a pedestal shield. The first annular portion is attached the pedestal at a first location. The first annular portion is located at or below a plane including the substrate. The second annular portion is attached to the pedestal at a second location that is below the first location. The first annular portion is spaced a predetermined distance from the second annular portion and is electrically isolated from the second annular portion.
Claims30
A shielding system for a physical vapor deposition (PVD) chamber, the PVD chamber including a pedestal supporting a substrate, the shielding system comprising:
- a first annular portion of a pedestal shield that is attached to the pedestal at a first location, wherein the first annular portion is located at or below a plane including the substrate;
- and
- a second annular portion of the pedestal shield that is attached to the pedestal at a second location that is below the first location,
- wherein the first annular portion is spaced a predetermined distance from the second annular portion and is electrically isolated from the second annular portion.
A method for shielding in a physical vapor deposition (PVD) chamber, the PVD chamber including a pedestal supporting a substrate, the method comprising:
- attaching a first annular portion of a pedestal shield to the pedestal at a first location at or below a plane including the substrate;
- attaching a second annular portion of the pedestal shield to the pedestal at a second location that is below the first location;
- spacing the first annular portion a predetermined distance from the second annular portion;
- and
- electrically isolating the first annular portion from the second annular portion.
A physical vapor deposition (PVD) chamber, comprising:
- a pedestal supporting a substrate, wherein the pedestal includes a ring portion, and wherein an upper surface of the ring portion slopes downwardly from a radially inner diameter of the ring portion to a radially outer diameter of the ring portion;
- a first annular portion of a pedestal shield that is attached to the pedestal and that is located at or below a plane including the substrate;
- and
- a second annular portion of the pedestal shield that includes a straight portion and a first curved portion,
- wherein the straight portion is generally perpendicular to the plane including the substrate and extends from the first annular portion towards a bottom chamber wall,
- wherein the first curved portion extends from the straight portion towards a side chamber wall, and
- wherein the first annular portion and the straight portion are adjacent to the ring portion of the pedestal.
A method for shielding in a physical vapor deposition (PVD) chamber, comprising:
- arranging a pedestal configured to support a substrate in the PVD chamber,
- configuring an upper surface of a ring portion of the pedestal to slope downwardly from a radially inner diameter of the ring portion to a radially outer diameter of the ring portion;
- attaching a pedestal shield including a first annular portion and a second annular portion to the pedestal, wherein the second annular portion includes a straight portion and a first curved portion;
- arranging the first annular portion of the pedestal shield at or below a plane including the substrate;
- arranging the straight portion generally perpendicular to the plane including the substrate, wherein the straight portion extends from the first annular portion towards a bottom chamber wall;
- and
- arranging the first curved portion to extend from the straight portion towards a side chamber wall,
- wherein the first annular portion and the straight portion are adjacent to a ring portion of the pedestal.
Dependencies are inferred from the claim text.