Particle monitor system and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsTsuyoshi MORIYA, Takashi ENOMOTO
Life of this patent
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Abstract
A particle monitor system that can detect fine particles in a substrate processing apparatus. The substrate processing apparatus has a chamber in which a substrate is housed and subjected to processing, a dry pump that exhausts gas out of the chamber, and a bypass line that communicates the chamber and the dry pump together. The particle monitor system has a laser light oscillator that irradiates laser light toward a space in which the particles may be present, and a laser power measurement device that is disposed on an optical path of the laser light having passed through the space and measures the energy of the laser light.
Claims16
A particle monitor system that detects particles in an exhaust pipe of a substrate processing apparatus having a housing chamber in which a substrate is housed and subjected to processing, an exhausting device that exhausts gas out of the housing chamber, and the exhaust pipe that communicates the housing chamber and the exhausting device together, the particle monitor system comprising:
- a laser light irradiating device that is disposed on the exhaust pipe and irradiates laser light toward a space in the exhaust pipe into which the particles flow;
- and
- a laser light measurement device that is disposed on an optical path of the laser light having passed through the space in the exhaust pipe and measures energy of the laser light,
- wherein the particle monitor system detects particles that flow into the space based on a difference between an energy of the laser light irradiated from the laser light irradiating device and an energy of the laser light measured by the laser light measurement device.
A particle monitor system that detects particles in a housing chamber of a substrate processing apparatus having the housing chamber in which a substrate is housed and subjected to processing, an exhausting device that exhausts gas out of the housing chamber, and an exhaust pipe that communicates the housing chamber and the exhausting device together, the particle monitor system comprising:
- a laser light irradiating device that is disposed on the housing chamber and irradiates laser light toward a space in the housing chamber into which the particles flow;
- and
- a laser light measurement device that is disposed on an optical path of the laser light having passed through the space in the housing chamber and measures energy of the laser light,
- wherein the particle monitor system detects particles that flow into the space based on a difference between an energy of the laser light irradiated from the laser light irradiating device and an energy of the laser light;
- measured by the laser light measurement device.
Dependencies are inferred from the claim text.