Protection module for euv lithography apparatus, and euv lithography apparatus

An extreme ultra-violet (EUV) lithography apparatus, comprising:

• a vacuum chamber,
• a housing within the vacuum chamber and at least one component arranged in the housing,
• at least one gas feed configured and arranged to introduce a gas flow into the housing, which emerges from the housing through at least one opening, and
• a light source arranged outside the housing at the at least one opening and configured to illuminate the at least one opening with radiation.

A sub-system for an extreme ultra-violet lithography apparatus, comprising:

• a vacuum chamber,
• a housing within the vacuum chamber and at least one component arranged in the housing,
• at least one gas feed configured and arranged to introduce a gas flow into the housing, which emerges from the housing through at least one opening, and
• a light source arranged outside the housing at the at least one opening and configured to illuminate the at least one opening with radiation
• wherein the sub-system consists essentially of a projection system, an illumination system or a beam-shaping system.