Nanostructured spectral filter and image sensor
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsAlexandre Mary, Yohan Desieres
Life of this patent
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Abstract
A spectral filter (150.1-150.4) comprising at least one metallic layer (101) structured by at least one hole (250.1-250.4) passing through two opposite mains faces of the metallic layer and comprising, in a plane parallel to a plane of one of the two main faces, a first rectangular section whereof a first side has a dimension between around 40 nm and 100 nm, and whereof a second side, perpendicular to the first side, has a dimension between around 150 nm and 1000 nm, and a second rectangular section centred relative to the first rectangular section, a first side of the second section being parallel to the second side of the first section and having a dimension between around 40 nm and 100 nm.
Claims21
A spectral filter comprising at least one metallic layer structured by at least one hole passing through two opposite main faces of the metallic layer and comprising, in a plane parallel to a plane of one of the two main faces, a first rectangular section such that a first side has a dimension between about 40 nm and 100 nm, wherein a second side, perpendicular to the first side, has a dimension between about 150 nm and 1000 nm, and a second rectangular section centred relative to the first rectangular section, and wherein a first side of the second rectangular section is parallel to the second side of the first rectangular section and has a dimension between about 40 nm and 100 nm.
A method for producing a spectral filter, comprising at least the following steps:
- structuring a dielectric layer;
- forming at least one dielectric portion enclosed by empty zones passing through two opposite main faces of the dielectric layer, the dielectric portion comprising, in a plane parallel to a plane of one of the two main faces, at least one first rectangular section wherein a first side has a dimension between about 40 nm and 100 nm, and wherein a second side, perpendicular to the first side, has a dimension between about 150 nm and 1000 nm, and a second rectangular section centred relative to the first rectangular section, a first side of the second rectangular section being parallel to the second side of the first rectangular section and having a dimension between about 40 nm and 100 nm,
- depositing a metallic layer at least in the empty zones formed in the dielectric layer around the dielectric portion,
- planarizing the metallic layer;
- and
- removing the dielectric portion.
A method for producing a spectral filter, comprising at least one etching step of a metallic layer according to a pattern comprising at least one hole passing through two opposite main faces of the metallic layer, the hole comprising, in a plane parallel to a plane of one of the two main faces, a first rectangular section wherein a first side has a dimension between about 40 nm and 100 nm, and wherein a second side, perpendicular to the first side, has a dimension between about 150 nm and 1000 nm, and a second rectangular section centred relative to the first rectangular section, a first side of the second rectangular section being parallel to the second side of the first rectangular section and having a dimension between about 40 nm and 100 nm.
Dependencies are inferred from the claim text.