Sheet with reformed layer and manufacturing method thereof
AssigneeKimoto Co., Ltd.
InventorsJingchun Jin, Kanami Yamazaki, Masato Saito
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Abstract
Provided is a simple method for preventing oligomer deposition onto a film surface. Oligomer deposition onto the surface of a film substrate 11 is prevented by irradiating the film substrate 11 with ultraviolet light at an exposure dosage of 1500 mJ/cm2 or larger, modifying at least a part of the film substrate 11, and forming a reformed layer 12.
Claims14
A manufacturing method of a sheet with a reformed layer formed by modifying at least a part of a film substrate, comprising the step of irradiating ultraviolet light to the film substrate to form the reformed layer.
A method of preventing oligomer deposition onto a film substrate surface, comprising the steps of irradiating ultraviolet light to the film substrate and modifying at least a part of the film substrate to form a reformed layer.
A sheet with a reformed layer formed by modifying at least a part of a film substrate, wherein the reformed layer is formed by irradiating ultraviolet light to the film substrate.
Dependencies are inferred from the claim text.