Piezoelectric film, piezoelectric device, liquid ejection apparatus, and method of producing piezoelectric film
OwnerTakayuki NAONOinventor
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Abstract
A piezoelectric film is formed on a surface of a substrate by a vapor deposition process without generating grain boundaries which are substantially parallel to the surface of the substrate and are caused by lamination. A normal of a (100) plane of each of crystals constituting the piezoelectric film is inclined from a normal of the surface of the substrate by an angle of not smaller than 6° and not larger than 36°.
Claims15
A piezoelectric film which is formed on a surface of a substrate by a vapor deposition process without generating grain boundaries which are substantially parallel to the surface of the substrate and are caused by lamination, wherein a normal of a (100) plane of each of crystals constituting the piezoelectric film is inclined from a normal of the surface of the substrate by an angle of not smaller than 6° and not larger than 36°.
A method of producing a piezoelectric film, comprising the step of forming a piezoelectric film on a surface of a substrate by a vapor deposition process, the piezoelectric film having a columnar crystal structure in which a normal of a (100) plane of each of crystals constituting the piezoelectric film is inclined from a normal of the surface of the substrate by an angle of not smaller than 6° and not larger than 36°.
Dependencies are inferred from the claim text.