Mems structure and manufacturing method thereof
AssigneeKabushiki Kaisha Toyota Chuo Kenkyusho
InventorsHirofumi FUNABASHI, Yutaka NONOMURA, Yoshiyuki HATA, Motohiro FUJIYOSHI, Teruhisa AKASHI, Yoshiteru OMURA
Life of this patent
Estimating the term…
Abstract
In a MEMS structure, a first trench which penetrates the first layer, the second layer and the third layer is formed, and a second trench which penetrates the fifth layer, the forth layer and the third layer is formed. The first trench forms a first part of an outline of the movable portion in a view along the stacked direction. The second trench forms a second part of the outline of the movable portion in the view along the stacked direction. At least a part of the first trench overlaps with the first extending portion in the view along the stacked direction.
Claims13
A MEMS structure including a first layer, a second layer, a third layer, a forth layer and a fifth layer stacked in this order along a stacked direction, the MEMS structure comprising:
- a stacked portion in which the first layer, the second layer, the third layer, the forth layer and the fifth layer are stacked;
- a movable portion formed in the third layer and supported by a beam;
- a first extending portion formed in the fifth layer and extending from the stacked portion;
- and
- a first facing portion formed in the fifth layer, connected to the first extending portion and facing the movable portion, wherein a first space is formed between the first facing portion and the movable portion, wherein a first trench which penetrates the first layer, the second layer and the third layer is formed, a second trench which penetrates the fifth layer, the forth layer and the third layer is formed, in a view along the stacked direction, the first trench forms a first part of an outline of the movable portion, in the view along the stacked direction, the second trench forms a second part of the outline of the movable portion, and in the view along the stacked direction, at least a part of the first trench overlaps with the first extending portion.
A manufacturing method of a MEMS structure including a first layer, a second layer, a third layer, a forth layer and a fifth layer stacked in this order along a stacked direction, the manufacturing method comprising:
- forming a first trench which penetrates the first layer, the second layer and the third layer, forming a second trench which penetrates the fifth layer, the forth layer and the third layer, and removing a part of the forth layer, wherein in the step of forming the first trench, the first trench forms a first part of an outline of a movable portion in the third layer in a view along the stacked direction, in the step of forming the second trench, the second trench forms a second part of the outline of the movable portion in the third layer in the view along the stacked direction, in the step of removing the part of the forth layer, the part of the forth layer between the movable portion and the fifth layer is removed, and in the view along the stacked direction, a part of the fifth layer extends over the first trench and faces the movable portion.
Dependencies are inferred from the claim text.