Method of producing a radiation-emitting thin film component and radiation-emitting thin film component
AssigneeOSRAM Opto Semiconductors GmbH
InventorsHans-Jurgen Lugauer, Klaus Streubel, Martin Strassburg, Reiner Windisch, Karl Engl
Life of this patent
Estimating the term…
Abstract
A method of producing a radiation-emitting thin film component includes providing a substrate, growing nanorods on the substrate, growing a semiconductor layer sequence with at least one active layer epitaxially on the nanorods, applying a carrier to the semiconductor layer sequence, and detaching the semiconductor layer sequence and the carrier from the substrate by at least partial destruction of the nanorods.
Claims16
1-15. (canceled)
A method of producing a radiation-emitting thin film component comprising:
- providing a substrate;
- growing nanorods on the substrate;
- growing a semiconductor layer sequence with at least one active layer epitaxially on the nanorods;
- applying a carrier to the semiconductor layer sequence;
- and
- detaching the semiconductor layer sequence and the carrier from the substrate by at least partial destruction of the nanorods.
A radiation-emitting thin film component comprising:
- a carrier;
- a semiconductor layer sequence applied on the carrier, which semiconductor layer sequence has at least one active layer that emits electromagnetic radiation;
- and
- a light outcoupling structure formed of nanorods and located on a side of the semiconductor layer sequence remote from the carrier;
- wherein the nanorods are conical or pyramidal in shape and a continuous layer is formed by the nanorods on a major side of the semiconductor layer sequence.
Dependencies are inferred from the claim text.