Semiconductor light emitting device and method for manufacturing the same
AssigneeKabushiki Kaisha Toshiba
InventorsKotaro Zaima, Toru Gotoda, Toshiyuki Oka, Shinya Nunoue
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AssigneeKabushiki Kaisha Toshiba
InventorsKotaro Zaima, Toru Gotoda, Toshiyuki Oka, Shinya Nunoue
Estimating the term…
Certain embodiments provide a method for manufacturing a semiconductor light emitting device, including: providing a first stack film on a first substrate, the first stack film being formed by stacking a p-type nitride semiconductor layer, an active layer having a multiquantum well structure of a nitride semiconductor, and an n-type nitride semiconductor layer in this order; forming an n-electrode on an upper face of the n-type nitride semiconductor layer; and forming a concave-convex region on the upper face of the n-type nitride semiconductor layer by performing wet etching on the upper face of the n-type nitride semiconductor layer with the use of an alkaline solution, except for a region in which the n-electrode is formed.
A semiconductor light emitting device comprising:
A method for manufacturing a semiconductor light emitting device, comprising:
Dependencies are inferred from the claim text.