Apparatus for producing trichlorosilane
AssigneeMitsubishi Materials Corporation
InventorsMasami Miyake, Kazuki Mizushima, Wataru Saiki, Naoya Murakami
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Abstract
An apparatus for producing trichlorosilane from raw gas containing silicon tetrachloride and hydrogen, having: a reaction chamber being supplied with the raw gas for generating reacted gas containing trichlorosilane and hydrogen; a plurality of heaters heating the raw gas and having exothermic portions being disposed along a vertical direction in the reaction chamber; a plurality of electrodes being connected to basal portions of the heaters; and a radiation plate being disposed between the exothermic portions of the heaters.
Claims5
An apparatus for producing trichlorosilane from raw gas including silicon tetrachloride and hydrogen, comprising:
- a reaction chamber being supplied with the raw gas for generating reacted gas including trichlorosilane and hydrogen;
- a plurality of heaters heating the raw gas and having exothermic portions being disposed along a vertical direction in the reaction chamber;
- a plurality of electrodes being connected to basal portions of the heaters;
- and
- a radiation plate being disposed between the exothermic portions of the heaters.
Dependencies are inferred from the claim text.