Apparatus for producing trichlorosilane and method for producing trichlorosilane
AssigneeMitsubishi Materials Corporation
InventorsMasami Miyake, Wataru Saiki
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AssigneeMitsubishi Materials Corporation
InventorsMasami Miyake, Wataru Saiki
Estimating the term…
An apparatus for producing trichlorosilane, comprising: a reaction chamber into which the raw gas is introduced to produce a reaction gas; a plurality of heaters disposed inside the reaction chamber to heat the raw gas; and a plurality of electrodes connected to basal portions of the heaters, wherein the heaters include first heaters each having an exothermic portion and second heaters each having an exothermic portion shorter than that of the first heater and a radiation plate connected to the exothermic portion, wherein a partial portion of the exothermic portion of the first heater faces the radiation plate of the second heaters; the reaction chamber has an introducing port of the raw gas on a side of the exothermic portion of the second heater; and the reaction chamber has discharge port of the reaction product gas on a side of the radiation plate of the second heater is arranged.
An apparatus for producing trichlorosilane from a raw gas that includes silicon tetrachloride and hydrogen, comprising:
A method for producing trichlorosilane, comprising:
Dependencies are inferred from the claim text.