Gas distributing means and substrate processing apparatus including the same
AssigneeJusung Engineering Co., Ltd.
InventorsMYUNG-GON SONG, JUNG-RAK LEE, JAE-CHUL DO, BU-IL JEON, SEONG-DAE CHOI
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Abstract
A substrate processing apparatus includes a process chamber having a chamber lid and a chamber body to provide a reaction space and a gas distributing means including a plate and an injection part in the process chamber. The injection part includes a plurality of through holes in the plate and a discharge portion capable of being in fluid communication with the plurality of through holes. The discharge portion has a matrix shape and provides a space where a plasma is discharged. The apparatus additionally includes a susceptor in the process chamber. The susceptor faces the gas distributing means.
Claims26
A substrate processing apparatus, comprising:
- a process chamber including a chamber lid and a chamber body to provide a reaction space;
- a gas distributing means including a plate and an injection part in the process chamber, the injection part including a plurality of through holes in the plate and a discharge portion capable of being in fluid communication with the plurality of through holes, the discharge portion having a matrix shape and providing a space where a plasma is discharged;
- and
- a susceptor in the process chamber, the susceptor facing the gas distributing means.
A substrate processing apparatus, comprising:
- a process chamber including a chamber lid and a chamber body to provide a reaction space;
- a plurality of plasma source electrodes on an inner surface of the chamber lid;
- a plurality of first gas distributing means in the plurality of plasma source electrodes, respectively, each of the plurality of first gas distributing means including a first buffer space capable of accommodating a first process gas, a plurality of first through holes capable of being in fluid communication with the first buffer space and a first discharge portion capable of being in fluid communication with the plurality of first through holes, the first discharge portion having a matrix shape and providing a first space where a first plasma of the first process gas is discharged;
- and
- a susceptor in the process chamber, the susceptor facing the plurality of plasma source electrodes.
A gas distributing means for a substrate processing apparatus, comprising:
- a plate including first and second surfaces;
- and
- an injection part including a plate and an injection part, wherein the injection part has a plurality of through holes extending from the first surface toward the second surface in the plate and a discharge portion capable of being in fluid communication with the plurality of through holes, the discharge portion having a matrix shape and providing a space where a plasma is discharged.
A method of manufacturing a gas distributing means for a substrate processing apparatus, the method comprising:
- providing a plate having first and second surfaces;
- forming a plurality of first through holes extending from the first surface toward the second surface;
- forming a plurality of second through holes capable of being in fluid communication with the plurality of first through holes;
- and
- forming a discharge portion capable of being in fluid communication with the plurality of second through holes, the discharge portion having a matrix shape and providing a space where a plasma is discharged.
Dependencies are inferred from the claim text.