US 2011/0214609 A1Published application

Atmospheric plasma apparatus

AssigneeFUJIFILM Corporation

InventorHisashi TAKAHASHI

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Abstract

An atmospheric plasma apparatus for depositing a layer on a continuous base film transported in its longitudinal direction includes an electrode for treatment provided opposite to the peripheral surface of a drum electrode and upstream of an electrode for deposition in the direction of transportation of the base film, an electric power source for treatment which applies voltages to the electrode for treatment, and a reactive gas-feeding element for feeding a reactive gas for surface treatment between the drum electrode and the electrode for treatment. The atmospheric plasma apparatus as such is capable of depositing a layer without impairing effects of surface treatment, allowing a higher adhesion between the base film and the layer deposited thereon and, consequently, an efficient, successive deposition of a high-quality layer.

Claims17

Dependent claims

An atmospheric plasma apparatus for depositing a layer on a continuous base film transported in its longitudinal direction, comprising:

a cylindrical drum electrode transporting the base film wound onto the electrode in a specified area of a peripheral surface thereof;
an electrode for deposition provided opposite to the peripheral surface of the drum electrode;
an electric power source for deposition which applies voltages to the electrode for deposition;
a gaseous raw material-feeding means for feeding between the drum electrode and the electrode for deposition a gaseous raw material for the layer to be deposited;
an electrode for treatment provided opposite to the peripheral surface of the drum electrode and upstream of the electrode for deposition in a direction of transportation of the base film;
an electric power source for treatment which applies voltages to the electrode for treatment;
and
a reactive gas-feeding means for feeding a reactive gas for surface treatment between the drum electrode and the electrode for treatment.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application: 13/038,066Filed 1 Mar 2011
Priority: JP 2010-0454022 Mar 2010
Published: 8 Sep 2011
Term ends: Not estimatedThe source records don’t support an estimate.

Classification14 codes

C23C 16/448
Characterised by the method of coating: characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation…
C23C 14/562
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks: for coating elongated substrates
C23C 16/45595
Characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber: atmospheric CVD gas…
C23C 16/54
Characterised by the method of coating: apparatus specially adapted for continuous coating