Water-rich stripping and cleaning formulation and method for using same
AssigneeAir Products and Chemicals, Inc.
InventorsMadhukar Bhaskara Rao, Gautam Banerjee, Thomas Michael Wieder, Yi-Chia Lee, Wen Dar Liu, Aiping Wu
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Abstract
The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
Claims22
A water-rich stripping and cleaning formulation, comprising:
- from 1 to 30% by weight of at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures thereof;
- from 0.1 to 5% by weight of a corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline;
- from 5% to 45% by weight of an alkanolamine which is miscible with said hydroxylamine;
- and
- at least 50% by weight of water.
A water-rich stripping and cleaning formulation, comprising:
- from 1 to 30% by weight of at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures thereof;
- from 0.1 to 5% by weight of a corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline;
- from 5% to 45% by weight of a water-soluble solvent;
- and
- at least 50% by weight of water.
A method of removing photoresist, etch or ash residue, and contaminants from a semiconductor substrate, comprising:
- contacting the semiconductor substrate with a formulation comprising:
- from 1 to 30% by weight of at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures thereof;
- from 0.1 to 5% by weight of a corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline;
- one component selected from the group consisting of from 5% to 45% by weight of an alkanolamine which is miscible with said hydroxylamine,
- from 5% to 45% by weight of a water-soluble solvent, and the combinations thereof;
- and
- at least 50% by weight of water.
Dependencies are inferred from the claim text.