Imprinting of Partial Fields at the Edge of the Wafer
AssigneeMolecular Imprints, Inc.
InventorsSidlgata V. Sreenivasan, Byung-Jin Choi
Life of this patent
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Abstract
Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
Claims19
A method of edge field patterning on a substrate using an imprint lithography system, comprising:
- positioning an imprint lithography template with the substrate such that a portion of the imprint lithography template is in superimposition with the substrate, the imprint lithography template having at least one mesa corresponding to a partial field on the substrate;
- depositing polymerizable material between the imprint lithography template and the partial field in superimposition with the imprint lithography template;
- positioning the imprint lithography template toward the substrate;
- applying an asymmetrical force to the template such that the center of pressure on the template is offset from the center of the template;
- solidifying the polymerizable material to provide an edge field pattern on the substrate.
A method of edge field patterning on a substrate using an imprint lithography system, comprising:
- positioning an imprint lithography template in superimposition with the substrate such that a portion of fields on the substrate are classified as partial fields, the imprint lithography template having at least one mesa corresponding to at least one partial field on the substrate;
- depositing polymerizable material between the imprint lithography template and each full field in superimposition with the imprint lithography template;
- contacting the imprint lithography template to the polymerizable material;
- applying an asymmetrical force to the template such that the center of pressure on the template is offset from the center of the template;
- and,
- solidifying the polymerizable material to provide an edge field pattern on the substrate.
A method comprising:
- depositing a transfer layer on a substrate positioned within an imprint lithography system;
- depositing polymerizable material between full fields of the substrate and an imprint lithography template in superimposition with the substrate, the imprint lithography template having at least one mesa;
- contacting the imprint lithography template to the polymerizable material;
- applying an asymmetrical force to the template such that the center of pressure on the template is offset from the center of the template;
- and,
- solidifying the polymerizable material to provide an edge field pattern on the substrate.
Dependencies are inferred from the claim text.