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US 2011/0212256 A1Published application
Deposition rate control
AssigneeFirst Solar, Inc.
InventorsMarkus E. Beck, Ming L. Yu, Erel Milshtein, Ashish Bodke, Ulrich A. Bonne, Raffi Garabedian
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Abstract
An vapor deposition control system includes a multi-level control scheme.
Claims25
A method of controlling a vapor deposition rate and composition comprising:
- measuring a vapor flux rate of a vapor being fed from a vapor source and deposited;
- calculating a deposition rate based on the measured vapor flux rate, wherein a correlation function between flux rate and the deposition rate is used to calculate the deposition rate;
- and
- controlling the deposition rate by a feedback control loop based on the deposition rate.
1 more element
A vapor deposition rate control system comprising:
- a vapor flux monitor capable of measuring a vapor flux rate of a vapor being deposited;
- a vapor flux control module capable of reading the flux monitor and controlling the vapor flux rate by adjusting a vapor source feed rate from a vapor source;
- and
- a feedback control loop based on a correlation function between the flux rate and a deposition rate of the vapor being deposited, to correlate the flux rate to the deposition rate and control the deposition rate by the control module.
1 more element
Dependencies are inferred from the claim text.