Spectral Purity Filter, Radiation Source, Lithographic Apparatus, and Device Manufacturing Method
AssigneeASML Netherlands B.V.
InventorsMartin Jacobus Johan Jak, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Andrei Mikhailovich Yakunin
Life of this patent
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Abstract
A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.
Claims21
A spectral purity filter configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation.
A source module for use in or with a lithographic apparatus, the source module being constructed to generate extreme ultraviolet (EUV) radiation and to output the EUV radiation and non-EUV secondary radiation, the source module comprising a spectral purity filter configured to allow transmission therethrough of the extreme ultraviolet (EUV) radiation and to refract or reflect the non-EUV secondary radiation.
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A device manufacturing method comprising:
- generating radiation comprising extreme ultraviolet (EUV) radiation and non-EUV secondary radiation using a radiation source;
- filtering the radiation to allow transmission of EUV radiation and to refract or reflect non-EUV secondary radiation;
- and
- projecting a patterned beam of the transmitted EUV radiation onto a substrate.
A lithographic apparatus comprising:
- a source module configured to generate extreme ultraviolet (EUV) radiation and to output the EUV radiation and non-EUV secondary radiation;
- a spectral purity filter configured to allow transmission therethrough of the EUV radiation and to refract or reflect the non-EUV secondary radiation;
- and
- a projection system configured to project a pattern beam of radiation comprising the EUV radiation onto a substrate.
Dependencies are inferred from the claim text.